CAS No. 12055-24-2

Hafnium Titanate Pricing >

Chemical Identifiers

Linear Formula HfTiO4
Pubchem CID 166054
MDL Number N/A
EC No. 235-014-8
IUPAC Name hafnium(4+); oxygen(2-); titanium(4+)
SMILES [Hf+4].[Ti+4].[O-2].[O-2].[O-2].[O-2]
InchI Identifier InChI=1S/Hf.4O.Ti/q+4;4*-2;+4
InchI Key KUVFGOLWQIXGBP-UHFFFAOYSA-N

Health & Safety Information

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Risk Codes N/A
Safety Statements N/A
Transport Information N/A

Reseach

  • Hafnium titanate bilayer structure multimetal dielectric nMOSCAPs. Rhee SJ, Zhu F, Kim HS, Choi CH, Kang CY, Zhang M, Lee T, Ok I, Krishnan SA, Lee JC. IEEE Electron Device Letters. 2006 Mar 27;27(4):225-7.
  • Thermophysical properties of hafnium titanate. G. Panneerselvam, R. Venkata Krishnan, K. Ananthasivan, M. P. Antony. Ceramics International, Volume 38, Issue 6, August 2012, Pages 5219-5222.
  • Microstructural factors influencing fracture toughness of hafnium titanate. R. G. Hoagland, C. W. Marschall, A. R. Rosenfield, G. Hollenberg, R. Ruh. Materials Science and Engineering, Volume 15, Issue 1, July 1974, Pages 51-62.
  • Hafnium titanate as a high permittivity gate insulator: Electrical and physical characteristics and thermodynamic stability. Li M, Zhang Z, Campbell SA, Li HJ, Peterson JJ. Journal of Applied Physics. 2007 Feb 15;101(4):044509.
  • Intrinsic metastability of orthorhombic HfTiO 4 in thin film hafnia-titania. Cisneros-Morales MC, Aita CR. Applied Physics Letters. 2011 Jan 31;98(5):051909.
  • Formation of monoclinic hafnium titanate thin films via the sol–gel method. Kidchob T, Falcaro P, Schiavuta P, Enzo S, Innocenzi P. Journal of the American Ceramic Society. 2008 Jul;91(7):2112-6.
  • Growth and material characterization of hafnium titanates deposited by atomic layer deposition. Popovici M, Delabie A, Van Elshocht S, Clima S, Pourtois G, Nyns L, Tomida K, Menou N, Opsomer K, Swerts J, Detavernier C. Journal of The Electrochemical Society. 2009 Oct 1;156(10):G145-51.
  • New high-pressure phase of HfTiO4 and ZrTiO4 ceramics. Daniel Errandonea, David Santamaria-Perez, Tatiana Bondarenko, Oleg Khyzhun. Materials Research Bulletin, Volume 45, Issue 11, November 2010, Pages 1732-1735.
  • Investigation of microstructure, micro-mechanical and optical properties of HfTiO4 thin films prepared by magnetron co-sputtering. Michal Mazur, Damian Wojcieszak, Jaroslaw Domaradzki, Danuta Kaczmarek, Piotr Domanowski. Materials Research Bulletin, Volume 72, December 2015, Pages 116-122.
  • Electrical properties of nanocrystalline HfTiO4 gate insulator. Domaradzki J, Kaczmarek D, Borkowska A, Wolcyrz M, Paszkiewicz B. Physica Status Solidi (A). 2006 Jul;203(9):2215-8.