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Cobalt Boron Sputtering Target

Linear Formula:

Co-B

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ORDER

PRODUCT	Product Code	ORDER	SAFETY DATA	TECHNICAL DATA
(2N) 99% Cobalt Boron Sputtering Target	CO-B-02-ST	Pricing >	SDS >	Data Sheet >
(3N) 99.9% Cobalt Boron Sputtering Target	CO-B-03-ST	Pricing >	SDS >	Data Sheet >
(4N) 99.99% Cobalt Boron Sputtering Target	CO-B-04-ST	Pricing >	SDS >	Data Sheet >
(5N) 99.999% Cobalt Boron Sputtering Target	CO-B-05-ST	Pricing >	SDS >	Data Sheet >

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Cobalt Boron Sputtering Target Properties (Theoretical)

Appearance	Target
Melting Point	N/A
Boiling Point	N/A
Density	N/A
Solubility in H2O	N/A

Cobalt Boron Sputtering Target Health & Safety Information

Signal Word	N/A
Hazard Statements	N/A
Hazard Codes	N/A
RTECS Number	N/A
Transport Information	N/A
MSDS / SDS	Request MSDS / SDS

About Cobalt Boron Sputtering Target

American Elements specializes in producing high purity Cobalt Boron Sputtering Targets with the highest possible density

High Purity (99.99%) Cobalt Boron Sputtering Target

and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. We offer all shapes and configurations of targets compatible with all standard guns including circular, rectangular, annular, oval, "dog-bone," rotatable (rotary), multi-tiled and others in standard, custom, and research sized dimensions. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes. We also produce Cobalt as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.

Cobalt Boron Sputtering Target Synonyms

N/A

Chemical Identifiers

Linear Formula	Co-B
MDL Number	N/A
EC No.	N/A

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Boron Iron Gallium Sputtering Target	Cobalt Manganese Silicon Sputtering Target	Cobalt Manganese Sputtering Target

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Payment Methods

American Elements accepts checks, wire transfers, ACH, most major credit and debit cards (Visa, MasterCard, AMEX, Discover) and Paypal.

For the convenience of our international customers, American Elements offers the following additional payment methods:

SOFORT bank tranfer payment for Austria, Belgium, Germany and SwitzerlandJCB cards for Japan and WorldwideBoleto Bancario for BraziliDeal payments for the Netherlands, Germany, Austria, Belgium, Italy, Poland, Spain, Switzerland, and the United KingdomGiroPay for GermanyDankort cards for DenmarkElo cards for BrazileNETS for SingaporeCartaSi for ItalyCarte-Bleue cards for FranceChina UnionPayHipercard cards for BrazilTROY cards for TurkeyBC cards for South KoreaRuPay for India

Related Elements

Cobalt

27 Co 58.933195000 Cobalt

See more Cobalt products. Cobalt (atomic symbol: Co, atomic number: 27) is a Block D, Group 9, Period 4 element with an atomic weight of 58.933195. Cobalt Bohr Model The number of electrons in each of cobalt's shells is 2, 8, 15, 2 and its electron configuration is [Ar]3d⁷ 4s². The cobalt atom has a radius of 125 pm and a Van der Waals radius of 192 pm. Cobalt was first discovered by George Brandt in 1732. In its elemental form, cobalt has a lustrous gray appearance. Cobalt is found in cobaltite, erythrite, glaucodot and skutterudite ores. Elemental Cobalt Cobalt produces brilliant blue pigments which have been used since ancient times to color paint and glass. Cobalt is a ferromagnetic metal and is used primarily in the production of magnetic and high-strength superalloys. Co-60, a commercially important radioisotope, is useful as a radioactive tracer and gamma ray source. The origin of the word Cobalt comes from the German word "Kobalt" or "Kobold," which translates as "goblin," "elf" or "evil spirit.

Boron

5 B 10.811000000 Boron

See more Boron products. Boron Bohr Model Boron (atomic symbol: B, atomic number: 5) is a Block P, Group 13, Period 2 element with an atomic weight of 10.81. The number of electrons in each of boron's shells is 2, 3 and its electron configuration is [He] 2s² 2p¹. The boron atom has a radius of 90 pm and a Van der Waals radius of 192 pm. Boron was discovered by Joseph Louis Gay-Lussac and Louis Jacques Thénard in 1808 and was first isolated by Humphry Davy later that year. Boron is classified as a metalloid is not found naturally on earth. Elemental Boron Along with carbon and nitrogen, boron is one of the few elements in the periodic table known to form stable compounds featuring triple bonds. Boron has an energy band gap of 1.50 to 1.56 eV, which is higher than that of either silicon or germanium. The name Boron originates from a combination of carbon and the Arabic word buraqu meaning borax.