Magnesium Hexafluorophosphate Sputtering Target

Linear Formula:

Mg(PF6)2

MDL Number:

N/A

EC No.:

N/A

ORDER

PRODUCT Product Code ORDER SAFETY DATA TECHNICAL DATA
(2N) 99% Magnesium Hexafluorophosphate Sputtering Target
MG-PF6-02-ST
Pricing > SDS > Data Sheet >
(3N) 99.9% Magnesium Hexafluorophosphate Sputtering Target
MG-PF6-03-ST
Pricing > SDS > Data Sheet >
(4N) 99.99% Magnesium Hexafluorophosphate Sputtering Target
MG-PF6-04-ST
Pricing > SDS > Data Sheet >
(5N) 99.999% Magnesium Hexafluorophosphate Sputtering Target
MG-PF6-05-ST
Pricing > SDS > Data Sheet >

Magnesium Hexafluorophosphate Sputtering Target Properties (Theoretical)

Compound Formula F12MgP2
Molecular Weight 314.25
Appearance target
Melting Point N/A
Boiling Point N/A
Density N/A
Solubility in H2O N/A
Exact Mass 313.913404
Monoisotopic Mass 313.913404

Magnesium Hexafluorophosphate Sputtering Target Health & Safety Information

Signal Word Danger
Hazard Statements H314-H302+H312+H332
Hazard Codes C
Precautionary Statements P260-P301+P330+P33-P303+P361+P353-P305+P351+P338-P405-P501
Risk Codes N/A
Safety Statements N/A
Transport Information UN 3264 8/PG II
GHS Pictograms

About Magnesium Hexafluorophosphate Sputtering Target

American Elements specializes in producing high purity Magnesium Hexafluorophosphate Sputtering Targets with the highest possible density High Purity (99.99%) Magnesium Hexafluorophosphate Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard sputtering targets for thin film deposition are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Rotary (cylindrical), round, rectangular, square, ring, annular, oval, "dog-bone" and other shaped targets are available in standard, custom, and research sized dimensions. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Please request a quote above for more information on lead time and pricing

Magnesium Hexafluorophosphate Sputtering Target Synonyms

Magnesium Dihexafluorophosphate, Phosphate(1-), hexafluoro-, magnesium (2:1) (CAS No. 113359-60-7)

Chemical Identifiers

Linear Formula Mg(PF6)2
MDL Number N/A
EC No. N/A
Beilstein/Reaxys No. N/A
Pubchem CID 14389152
IUPAC Name magnesium; dihexafluorophosphate
SMILES F[P-](F)(F)(F)(F)F.F[P-](F)(F)(F)(F)F.[Mg+2]
InchI Identifier InChI=1S/2F6P.Mg/c2*1-7(2,3,4,5)6;/q2*-1;+2
InchI Key BNMGWRMLSYNPEX-UHFFFAOYSA-N

Packaging Specifications

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Related Elements

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Magnesium

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